JPH0521841B2 - - Google Patents
Info
- Publication number
- JPH0521841B2 JPH0521841B2 JP58134480A JP13448083A JPH0521841B2 JP H0521841 B2 JPH0521841 B2 JP H0521841B2 JP 58134480 A JP58134480 A JP 58134480A JP 13448083 A JP13448083 A JP 13448083A JP H0521841 B2 JPH0521841 B2 JP H0521841B2
- Authority
- JP
- Japan
- Prior art keywords
- ultrapure water
- carbon dioxide
- dioxide gas
- resistivity
- permeable membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58134480A JPS6027603A (ja) | 1983-07-25 | 1983-07-25 | 超純水の比抵抗調整法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58134480A JPS6027603A (ja) | 1983-07-25 | 1983-07-25 | 超純水の比抵抗調整法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6027603A JPS6027603A (ja) | 1985-02-12 |
JPH0521841B2 true JPH0521841B2 (en]) | 1993-03-25 |
Family
ID=15129309
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58134480A Granted JPS6027603A (ja) | 1983-07-25 | 1983-07-25 | 超純水の比抵抗調整法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6027603A (en]) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002292362A (ja) * | 2001-03-30 | 2002-10-08 | Kurita Water Ind Ltd | 比抵抗調整水製造装置 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6265809A (ja) * | 1985-09-14 | 1987-03-25 | Koyo Kikai Sangyo Kk | 二重ベルトコンベア |
JPS62198127A (ja) * | 1986-02-25 | 1987-09-01 | Sanyo Electric Co Ltd | 半導体ウエハの洗浄方法 |
JP3814357B2 (ja) * | 1997-01-29 | 2006-08-30 | 日本碍子株式会社 | 超純水の比抵抗調整方法および比抵抗調整装置 |
US6884359B2 (en) | 2000-09-27 | 2005-04-26 | Dainippon Ink And Chemicals, Inc. | Apparatus and method for controlling resistivity of ultra pure water |
KR102376171B1 (ko) | 2016-12-20 | 2022-03-18 | 디아이씨 가부시끼가이샤 | 비저항치 조정 장치 및 비저항치 조정 방법 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5631432A (en) * | 1979-08-21 | 1981-03-30 | Ebara Infilco Co Ltd | Process for dissolving gas into liquid |
JPS5933461Y2 (ja) * | 1980-11-17 | 1984-09-18 | 三菱レイヨン株式会社 | 飲料水への炭酸ガス溶解装置 |
JPS587831A (ja) * | 1981-07-07 | 1983-01-17 | Sumitomo Shoji Kk | 高圧水によるウェハの洗浄方法及び装置 |
-
1983
- 1983-07-25 JP JP58134480A patent/JPS6027603A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002292362A (ja) * | 2001-03-30 | 2002-10-08 | Kurita Water Ind Ltd | 比抵抗調整水製造装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6027603A (ja) | 1985-02-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69616100T2 (de) | Verfahren und Vorrichtung zur Herstellung von ozonisiertem Wasser | |
DE69834856T2 (de) | Reinigen von Halbleiterscheiben und Mikroelektronik-Substraten | |
DE60316264T2 (de) | Hohlfasermembrankontaktvorrichtung und -verfahren | |
GB2343637A (en) | Adding carbon dioxide to a stream of ultra pure water using a gas permeable membrane | |
DE60107184T2 (de) | Vorrichtung und Verfahren zur Regelung des spezifischen Widerstandes von ultra reinem Wasser | |
JPH0521841B2 (en]) | ||
JP3690569B2 (ja) | 超純水の比抵抗調整装置及び調整方法 | |
JPH07180076A (ja) | アルシンの電解発生方法及び装置 | |
JPH11128704A (ja) | 液体中の溶存ガス濃度の調整装置及び調整方法 | |
JP4151088B2 (ja) | 水素含有超純水の供給装置 | |
JP3966482B2 (ja) | 超純水の比抵抗調整方法及びこれを用いた純水製造装置 | |
JPS62110795A (ja) | 高純度水の製造装置 | |
JP4278211B2 (ja) | プリコート式ろ過脱塩装置のプリコート方法 | |
JP2000070887A (ja) | 炭酸ガス溶存純水供給方法及び炭酸ガス溶存純水供給ユニット並びにそれを備えた基板処理装置 | |
JP2003010660A (ja) | 超純水の比抵抗調整装置及び調整方法 | |
KR102275626B1 (ko) | 희석액 제조장치 및 희석액 제조방법 | |
KR100519391B1 (ko) | 이산화탄소가스를초순수에첨가하는장치및그방법 | |
JP4654526B2 (ja) | 比抵抗調整水製造装置 | |
JP3786232B2 (ja) | 超純水の比抵抗調整装置及び方法 | |
JPS614528A (ja) | 水溶性ガスの高純度溶液の製造装置 | |
JPS63178843A (ja) | 感光性塗布液の処理方法 | |
JP2002172318A (ja) | 超純水の比抵抗調整装置及び調整方法 | |
JPH04156903A (ja) | 脱気膜装置 | |
JP3814357B2 (ja) | 超純水の比抵抗調整方法および比抵抗調整装置 | |
JP7660749B1 (ja) | 超純水製造方法、超純水製造装置及び超純水製造システム |